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Thin film channel waveguides fabricated in metalorganic chemical vapor deposition grown BaTiO3 on MgO
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1996
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Materials ScienceChannel WaveguidesRidge HeightsOptical MaterialsEngineeringOxide ElectronicsApplied PhysicsGuided-wave OpticThin Film Process TechnologyThin FilmsEpitaxial GrowthWaveguide ThroughputChemical Vapor DepositionThin Film ProcessingPlanar Waveguide Sensor
We report on the fabrication of channel waveguides in epitaxial grown BaTiO3 layers on MgO. Layers were prepared by metalorganic chemical vapor deposition. Ridge waveguides with ridge heights ranging from 15 to 200 nm were fabricated in a 0.2-μm-thick film. Single mode waveguide throughput, scattering loss, and mode profiles are reported. Coating waveguides with spin on glass significantly increase waveguide throughput. Throughputs of up to 10.4% were measured in 15 nm ridge waveguides which were 2.85 mm long and coated with spin on glass. Waveguide throughput is found to increase significantly with an increase in wavelength from 1.06 to 1.55 μm.