Applied Physics Letters · 1998 · 88 citations · 13 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsHigh-frequency Semiconductor DevicesNoise In Electronic DevicesNoise In Semiconductor DevicesPhotodetectorsSemiconductor Device MaterialsWide Band Gap SemiconductorsAvalanche PhotodiodesExcess NoiseHigh-frequency PerformanceMolecular Beam EpitaxyNoise CharacteristicsNoise In PhotodetectorsP-i-n PhotodetectorsSemiconductor Noise
Low excess noise in avalanche photodetectors (APDs) is desired for improved sensitivity and high-frequency performance. Gain and noise characteristics are measured for InAlAs p-i-n homojunction APDs that were grown with varying i-region widths on InP by molecular beam epitaxy. The effective ionization ratio k (β/α) determined by noise measurements shows a dependence on multiplication region width, reducing from 0.31 to 0.18 for multiplication region thicknesses of 1600–200 nm. This trend follows previously shown results in AlGaAs-based APDs, which exhibit reduced excess noise due to nonlocal multiplication effects. These results show that this effect is a characteristic of thin avalanche regions and is not a material-specific phenomenon.
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<i>Semiconductor Optoelectronic Devices</i>
P. Bhattacharya, Lily Pang · Physics Today · 1994 · 644 citations
Avalanche-Photodiode Frequency Response
R. B. Emmons · Journal of Applied Physics · 1967 · 341 citations