Publication | Closed Access
Passivation of grain boundaries in silicon
54
Citations
0
References
1982
Year
Materials ScienceGrain BoundariesEngineeringPhysicsMaterial PropertyMaterials FabricationMaterials CharacterizationApplied PhysicsMaterial InnovationMarch 1982Vacuum ScienceSemiconductor Device FabricationVacuum DeviceTechnologySilicon On InsulatorMicrostructureSilicon DebuggingStructural Materials
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation C. H. Seager, D. J. Sharp, J. K. G. Panitz, R. V. D’Aiello; Passivation of grain boundaries in silicon. Journal of Vacuum Science and Technology 1 March 1982; 20 (3): 430–435. https://doi.org/10.1116/1.571326 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search