Publication | Closed Access
Composition Dependence of Equal Thickness Fringes in an Electron Microscope Image of GaAs/Al<sub>x</sub>Ga<sub>1-x</sub> As Multilayer Structure
96
Citations
4
References
1985
Year
Aluminium NitrideEngineeringElectron-beam LithographyMicroscopyElectron DiffractionEqual Thickness FringesComposition AnalysisElectron MicroscopyMolecular Beam EpitaxyEpitaxial GrowthMaterials ScienceMaterials EngineeringElectrical EngineeringCrystalline DefectsEqual Thickness FringeElectron Microscope ImageMicroelectronicsCategoryiii-v SemiconductorDepth-graded Multilayer CoatingMicrostructureApplied PhysicsElectron MicroscopeComposition Dependence
A new method is presented for the composition analysis of GaAs/Al x Ga 1- x As multilayer structure using transmission electron microscopy. It is found that the position of equal thickness fringe observed at the edge of a cleaved chip is closely related to the composition. Change in Al composition in GaAs/Al x Ga 1- x As superstructure is observed as a shift of the equal thickness fringe. Compositional abruptness at the heterointerface and compositional fluctuation in the thin layer can be estimated in the electron microscope image.
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