Applied Physics Letters · 1998 · 105 citations · 9 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsDopingP-n JunctionsSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsWide-bandgap SemiconductorsDiode Current-voltage CharacteristicsEpitaxial MaterialsForward Bias CharacteristicsGallium NitrideP-n Junction CharacteristicsSpace-charge RegionsSpace-charge-limited CurrentTraps
Electrical characteristics of lateral p+n diodes made from gallium nitride epitaxial layers on sapphire substrates are reported. The current–voltage characteristics are observed to have several distinct regions in which a tunneling current has been identified at low forward bias in addition to the conventional temperature-dependent diffusion current observed at moderate forward bias. A tunneling behavior indicates the presence of deep-level traps at the junction, which alter the electrical behavior of these junctions compared to the conventional behavior. In addition, space-charge-limited currents are found to influence these junctions at large forward and reverse bias.
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Hole Compensation Mechanism of P-Type GaN Films
Shuji Nakamura, Naruhito Iwasa, Masayuki Senoh et al. · Japanese Journal of Applied Physics · 1992 · 1.1K citations
A. R. Riben, D.L. Feucht · Solid-State Electronics · 1966 · 202 citations