Emission spectroscopy of glow-discharge and sputtering plasmas used in amorphous Si:H film deposition

Abstract

We analyze the optical emission spectra of glow discharge (g.d.) plasmas and find evidence for Si–H complexes. From a similar analysis of sputtering plasmas, we find that a significant silicon–hydrogen gas phase reaction does not occur. The dissimilarities of the plasmas out of which g.d. and sputtered films are condensed coupled with the similarities of the films themselves, lead us to reason that the properties of amorphous Si:H films are determined by structure that is locked into the growing film surfaces. To study the physics of how the hydrogen enters the Si:H matrix, one must turn to investigations of these surfaces.