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The effect of argon pressure, residual oxygen and exposure to air on the electrical and microstructural properties of sputtered chromium thin films

Materials ScienceMicrostructural PropertiesElectrical EngineeringMaterial AnalysisEngineeringSurface ScienceApplied PhysicsResidual OxygenArgon PressureThin FilmsChemical DepositionChemical Vapor DepositionThin Film ProcessingElectrical Insulation