Fabrication of Ge nanocrystals in SiO2 films by ion implantation: control of size and position - Concepedia

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Fabrication of Ge nanocrystals in SiO2 films by ion implantation: control of size and position

22

Citations

13

References

2002

Year

Kaori Masuda, Masahiro Yamamoto, Masatoshi Kanaya, Yoshihiko Kanemitsu

Journal of Non-Crystalline Solids

Materials ScienceNanoscale ScienceIon ImplantationEngineeringNanomaterialsNanotechnologyOxide ElectronicsApplied PhysicsGe NanocrystalsSilicon On InsulatorSio2 FilmsChemical Vapor Deposition

References

	Year	Citations

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