Chemical vapor deposition of silicon under reduced pressure in hot-wall reactors

A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

Michael E. Coltrin, Robert J. Kee, James A. Miller · Journal of The Electrochemical Society · 1984 · 342 citations

Natural Sciences, Chemical Engineering, Chemistry +17

A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal Reactor

F. C. Eversteyn, P. J. Severin, C. H. J. v. d. Brekel et al. · Journal of The Electrochemical Society · 1970 · 273 citations

Engineering, Materials Engineering, Materials Science +10

Growth and Physical Properties of LPCVD Polycrystalline Silicon Films

G. Harbeke, L. Krausbauer, E. F. Steigmeier et al. · Journal of The Electrochemical Society · 1984 · 245 citations

Natural Sciences, Materials Engineering, Materials Science +17

Modeling and Analysis of Low Pressure CVD Reactors

Klavs F. Jensen, David B. Graves · Journal of The Electrochemical Society · 1983 · 134 citations

Engineering, Materials Engineering, Materials Science +17

Low pressure deposition of polycrystalline silicon from silane

C.H.J. Van Den Brekel, L.J.M. Bollen · Journal of Crystal Growth · 1981 · 112 citations

Engineering, Materials Engineering, Materials Science +10