Atomic and radical densities in a hot filament diamond deposition system

Abstract

The gas phase densities of atomic carbon, atomic hydrogen, and methyl radicals are measured in a hot filament diamond deposition system by the use of absorption spectroscopy in the vacuum ultraviolet. The ratio of atomic to molecular hydrogen is also determined using the measured C and CH3 densities and the equilibrium constant for the hydrogen abstraction and recombination reactions that link the C and CH3 densities. The flux of C to the diamond surface is inadequate to explain the total growth rate, though C could have an important role in initiating growth. A model indicates that the hydrogen is dissociated at the filament and diffuses quickly throughout the rest of the system; gas phase reactions only have a small effect on the degree of dissociation. An increased input CH4 mole fraction results in lower hydrogen dissociation by poisoning the catalytic properties of the filament.