Journal of Applied Physics · 1975 · 119 citations · 11 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationSurface ScienceThin FilmsAcoustic MaterialsEpitaxial GrowthStrain EngineeringThin Film StrainThin-film MaterialsAluminum NitrideCrystal Growth MorphologyEpitaxial Growth MorphologyEpitaxial StrainEpitaxial Thin FilmsFilm Growth MechanismsGrowth MorphologyThin-film Growth Mechanisms
Aluminum nitride epitaxial films of thicknesses greater than 10 μ with excellent mechanical and chemical stability have been grown on R-plane sapphire substrates. The orientation relationship of single-crystal AlN on sapphire is discussed. Examination of the as-grown AlN film surface with a scanning electron microscope identifies the growth morphology and enables differentiation between good and poor quality films. The surface-acoustic-wave coupling constant K2 and propagation velocity Vs are measured out to a thickness-to-wavelength ratio t/λ=0.75 with typical K2 values of 0.8% and Vs of 6.1 km/sec. Preliminary results also indicate that AlN-sapphire interfacial strain extends about 1 μ into the AlN film.
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Epitaxially grown AlN and its optical band gap
Woosoon Yim, E. J. Stofko, P. J. Zanzucchi et al. · Journal of Applied Physics · 1973 · 600 citations
Natural Sciences, Materials Engineering, Materials Science +17
Some Properties of Aluminum Nitride
K. Taylor, C. A. Lenie · Journal of The Electrochemical Society · 1960 · 267 citations