Characterization of reactive ion etching of glass and its applications in integrated optics

Abstract

We report characterization of reactive ion etching (RIE) of soda–lime glass under various conditions. Etching rates of glass and photoresist have been measured while using three different reactive gas mixtures, i.e., CHF3/Ar, CF4/O2, and CF4/Ar. Experimental results are presented referring to the RIE fabrication of periodic structures in soda–lime glass ion-exchanged waveguide, starting from gratings which had been recorded in photoresist by holographic techniques.