Publication | Closed Access
Electrical conductivity of dense copper and aluminum plasmas
228
Citations
11
References
1998
Year
Dense CopperEngineeringPlasma SciencePlasma PhysicsLow DensityPlasma ElectronicsPlasma SimulationSuperconductivityPlasma TheoryPlasma ConfinementHigh Energy Density PhysicsElectrical EngineeringPhysicsElectrical PropertyAluminum PlasmasApplied PhysicsGas Discharge PlasmaPlasma ApplicationElectrical Insulation
Measurements are reported of the electrical conductivity of dense copper and aluminum plasmas in the temperature range 10--30 kK, in a density range from about one-fifth solid density down to $0.02{\mathrm{g}/\mathrm{c}\mathrm{m}}^{3}$. Plasmas were created by rapid vaporization of metal wires in a water bath. At temperatures below about 15 kK, as density decreases from the highest values measured, the conductivity falls roughly as the cube of density, reaches a minimum, and subsequently rises to approach the Spitzer prediction at low density. This minimum is not seen for temperatures above about 20 kK. These results are compared with several theoretical predictions.
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