Publication | Closed Access
Formation of a one-dimensional grating at the molecular scale by self-assembly of straight silicon nanowires
81
Citations
13
References
2007
Year
EngineeringNanodevicesStraight Silicon NanowiresAnisotropic SilverSurface NanotechnologyOptoelectronic DevicesIntegrated CircuitsSilicon On InsulatorMaterials FabricationEntire Substrate SurfaceSubmonolayer DepositionMolecular ScaleNanolithographyNanostructure SynthesisNanoscale ScienceNanolithography MethodMaterials SciencePhysicsNanotechnologyPhotonic MaterialsNanomanufacturingSurface NanoengineeringMicrofabricationSelf-assemblySurface ScienceApplied PhysicsNanofabricationOne-dimensional GratingNanostructures
Upon submonolayer deposition of silicon onto the anisotropic silver (110) surface flat lying individual Si nanowires, all oriented along the [−110] direction, can be grown at room temperature with a high aspect ratio. Upon deposition at ∼200°C, these one-dimensional nanostructures self-assemble by lateral compaction to form a regular array of essentially identical nanowires, ∼1.6nm in width, covering uniformly the entire substrate surface. They realize, at macroscopic sizes, a highly perfect one-dimensional grating with a molecular-scale pitch of just 2nm.
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