Refractive-index-adjustable SiO2-Ta2O5 films for integrated optical circuits

Abstract

This report is about the preparation and the optical transmission loss of rf-sputtered SiO2-Ta2O5 films that are suitable for use as transmission media in integrated optical circuits. It is shown that the films, which can be produced with a refractive-index range from 1.46 to 2.08 at 6328 Å wavelength by suitably selecting the ratio of the target constituents, exhibit a low optical transmission loss of less than 0.8 dB/cm for the TE0 mode.