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Isotopic study of metalorganic chemical vapor deposition of (Ba, Sr)TiO3 films on Pt
13
Citations
12
References
1999
Year
Materials ScienceMaterials EngineeringChemical EngineeringInorganic ChemistryIsotopic StudyM 18OEngineeringOxidation ResistanceBst FilmOxide ElectronicsSurface ScienceTio3 FilmsChemistryThin FilmsFilm-formation ReactionsChemical DepositionChemical Vapor DepositionThin Film Processing
Isotopic labeling experiments (18O2) have been carried out to understand the film-formation reactions in the metalorganic chemical vapor deposition of (Ba, Sr)TiO3 (BST) films. Time-of-flight secondary ion mass spectrometry reveals both M 18O and M 16O (M=Ba, Sr, Ti) in the BST films, indicating that the oxygen in the BST films originates from both the gas phase oxidants (18O), and the precursor ligands (16O). Use of a 50% 18O2-50% N2 16O mixture results in a reduction of 18O incorporation in the BST film, indicating direct involvement of N2O in the film-formation reactions. Addition of N2O in O2 also appears to improve film surface morphology and step coverage.
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