Thin film and surface characterization by specular X-ray reflectivity

Abstract

Abstract We review the use of specular X-ray reflectivity (XRR) for the characterization of thin-film and surface structures. Specular X-ray scattering at small scattering vectors allows characterization of electron density profiles perpendicular to the surface on the length scale of 0.1 to 100 nm. This allows measurement of surface morphology, thin films, multilayer structures, and buried interfaces. The technique is nondestructive and can be applied in situ in a variety of processing environments. In the first half of the article, we review the theory and methods of XRR, including analysis of XRR spectra by a multilayer optical approach and a discussion of surface roughness measurements by XRR and other techniques. In the second half, we present a wide range of examples of XRR applications in thin-film structures, dynamic processes, liquid surfaces, and macromolecular structures.