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Influence of doping rate in Er^3+:ZnO films on emission characteristics
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2008
Year
EngineeringTemperature DependentLuminescent GlassIi-vi SemiconductorOptical PropertiesZno FilmsCompound SemiconductorMaterials ScienceElectrical EngineeringZno MatrixPhotoluminescenceHigh-quality ErPhysicsOxide ElectronicsGallium OxideSemiconductor MaterialApplied PhysicsThin FilmsOptoelectronics
High-quality Er(3+):ZnO films were grown by the pulsed-laser deposition technique for 0.5 and 2 wt. % Er doping. Two peaks were observed at approximately 1.54 microm in the photoluminescence spectra of samples with 2 wt. % doping contrary to only one peak in the 0.5 wt. % doped sample. Both peaks were found to be strongly temperature dependent. The microscopic studies clearly illustrate that the appearance of the additional peak is attributed to the environment of Er(3+) ions in the form of ErO(6) clusters, which are optically active centers in the ZnO matrix. These results are very important for designing waveguides for telecommunications.