Publication | Closed Access
Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasma
16
Citations
12
References
2007
Year
Materials ScienceElectrical EngineeringEngineeringHbr/ar PlasmaNanoelectronicsSurface ScienceApplied PhysicsGas Discharge PlasmaMicroelectronicsPlasma EtchingZno FilmsPlasma ProcessingPlasma Application
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