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Electronic structure, charge distribution, and charge transfer in α- and β-Si <sub>3</sub> N <sub>4</sub> and at the Si(111)/Si <sub>3</sub> N <sub>4</sub> (001) interface
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Citations
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1997
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SemiconductorsIonic FormulaElectronic MaterialsPhysicsCharge TransferEngineeringNatural SciencesCharge TransportApplied PhysicsCondensed Matter PhysicsSurface ScienceSi-n BondSemiconductor MaterialChemistryCharge Carrier TransportElectronic StructureCharge Distribution
The electronic structure, charge distribution, and charge transfer in α- and β- Si3N4 and at the Si(111)/Si3N4(001) interface have been studied using a self-consistent first-principles LCAO method. The calculated charge transfer suggests that both in α- and β-phases, the ionic formula may be written as Si3+1.24N4−0.93. For the Si(111)/Si3N4(001) interface, the silicon atoms from the Si(111) side give some electrons to the N atoms of Si3N4 forming the Si-N bonds at the interface. One Si-N bond is associated with a charge transfer of about 0.31 electrons.
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