Publication | Open Access
Phase-selective vanadium dioxide (VO2) nanostructured thin films by pulsed laser deposition
26
Citations
46
References
2015
Year
Optical MaterialsEngineeringTwo-dimensional MaterialsLaser ApplicationsOptoelectronic DevicesChemistryNanostructure SynthesisPulsed Laser DepositionThin Film ProcessingNanophotonicsMaterials ScienceNanotechnologyOptoelectronic MaterialsNanomanufacturingGlass SubstrateCrystal PhaseLayered MaterialNanocrystalline MaterialNanomaterialsSurface ScienceApplied PhysicsPhase-selective Vanadium DioxideThin FilmsChemical Vapor Deposition
Thin films of monoclinic nanostructured vanadium dioxide are notoriously difficult to produce in a selective manner. To date, post-annealing, after pulsed laser deposition (PLD), has been used to revert the crystal phase or to remove impurities, and non-glass substrates have been employed, thus reducing the efficacy of the transparency switching. Here, we overcome these limitations in PLD by optimizing a laser-ablation and deposition process through optical imaging of the laser-induced plasma. We report high quality monoclinic rutile-type vanadium dioxide (VO2) (M1) nanoparticles without post-annealing, and on a glass substrate. Our samples demonstrate a reversible metal-to-insulator transition at ∼43 °C, without any doping, paving the way to switchable transparency in optical materials at room temperature.
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