Publication | Closed Access
The evolution of a GaN/sapphire interface with different nucleation layer thickness during two-step growth and its influence on the bulk GaN crystal quality
25
Citations
29
References
2015
Year
Materials ScienceWide-bandgap SemiconductorAluminium NitrideEngineeringGan/sapphire InterfaceSurface ScienceApplied PhysicsTwo-step GrowthNucleation Layer ThicknessGan Crystal QualityAluminum Gallium NitrideGallium OxideGan Power DeviceCategoryiii-v SemiconductorChemical Vapor Deposition
The role of the nucleation layer thickness on the GaN crystal quality grown by metal organic chemical vapor deposition is explored.
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