Band alignment between amorphous Ge2Sb2Te5 and prevalent complementary-metal-oxide-semiconductor materials

Abstract

Band alignment of amorphous Ge2Sb2Te5 and various substrates was obtained using high-resolution x-ray photoelectron spectroscopy. The valence band offset of Ge2Sb2Te5 on various complementary-metal-oxide-semiconductor (CMOS) materials, i.e., Si, SiO2, HfO2, Si3N4 and NiSi, were investigated with the aid of the core level, valence band, and energy loss spectra. Energy band lineups of Ge2Sb2Te5 on these materials were thus determined which can be used as for phase change memory device engineering and integration with CMOS technology.