Ultrafast laser inscription: perspectives on future integrated applications

Abstract This paper reviews the recent advancements achieved using ultrafast laser inscription (ULI) that highlight the cross‐disciplinary potential of the technology. An overview of waveguide fabrication is provided and the three distinct types of waveguide cross‐section architectures that have so far been fabricated in transparent dielectric materials are discussed. The paper focuses on two key emergent technologies driven by ULI processes. First, the recently developed photonic devices, such as compact mode‐locked waveguide sources and novel mid‐infrared waveguide lasers are discussed. Secondly, the phenomenon and applications of selective etching in developing ultrafast laser inscribed structures for compact lab‐on‐chip devices are elaborated. The review further discusses the conceivable future of ULI in impacting the aforementioned fields.