Manufacturing pathway and associated challenges for nanoscale computational systems

Abstract

We propose one possible manufacturing pathway for realizing nanodevice based computational fabrics that combines self-assembly based techniques with conventional photolithography. This pathway focuses on realizing the fabric as a whole including assembly of nanostructures, functionalization of devices, contacts and interconnects. Furthermore, this pathway is scalable to large systems, as multiple devices are created simultaneously in a self-aligning process step. We discuss the key sequence of steps for achieving nanoscale computational systems using the example of a simple digital logic circuit, and review the associated challenges involved for each of these.