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Crystallization and phase separation in Ge2+xSb2Te5 thin films
71
Citations
18
References
2003
Year
Materials ScienceMaterial AnalysisEngineeringCrystalline DefectsCrystal Growth TechnologySurface ScienceApplied PhysicsCondensed Matter PhysicsX-ray DiffractionSemiconductor MaterialThin Film Process TechnologyPhase SeparationThin FilmsEpitaxial GrowthCrystallographyThin Film Processing
The electrical properties and the structure of isothermally annealed thin films of Ge2+xSb2Te5 (x=0 and 0.5) have been studied by in situ electrical measurements, x-ray diffraction, and transmission electron microscopy analyses. Phase separation has been observed in samples with an excess of Ge; by annealing amorphous Ge2.5Sb2Te5 films at temperatures in the range 130–160 °C, the material cannot be completely converted into the metastable face-centered-cubic (fcc) structure. At temperatures higher than 160 °C, the residual amorphous material may be converted into a fcc structure with a lower lattice parameter.
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