Journal of Applied Physics · 2003 · 72 citations · 18 references
Natural SciencesMaterials SciencePhysicsCrystal StructureMaterials PhysicsThin FilmsAmorphous MaterialsAmorphous SemiconductorsAmorphous SolidsSemiconductor Thin FilmsThin Film Electrical PropertiesThin-film MaterialsAmorphous Thin FilmsAnnealing EffectsAnnealing Temperature EffectsElectrical Conductivity MeasurementsElectrical PropertiesElectrical Properties AnalysisIn-situ MeasurementsX-ray Diffraction Analysis
The electrical properties and the structure of isothermally annealed thin films of Ge2+xSb2Te5 (x=0 and 0.5) have been studied by in situ electrical measurements, x-ray diffraction, and transmission electron microscopy analyses. Phase separation has been observed in samples with an excess of Ge; by annealing amorphous Ge2.5Sb2Te5 films at temperatures in the range 130–160 °C, the material cannot be completely converted into the metastable face-centered-cubic (fcc) structure. At temperatures higher than 160 °C, the residual amorphous material may be converted into a fcc structure with a lower lattice parameter.
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Laser induced crystallization of amorphous Ge2Sb2Te5 films
V. Weidenhof, I. Friedrich, S. Ziegler et al. · Journal of Applied Physics · 2001 · 320 citations