Growth of nonpolar (112¯) ZnO films on LaAlO3 (001) substrates

Abstract

Nonpolar (112¯0) ZnO films were grown on LaAlO3 (001) single crystal substrates at temperature from 300 to 750 °C by pulsed laser deposition method. The films were examined using x-ray diffraction, reflection high energy electron diffraction, and photoluminescence measurements for the crystallinity. The surface morphology of ZnO films from atomic force microscopy exhibits L-shaped domains. Cross-sectional transmission electron microscopy with selected area diffraction reveals two types of a-plane ZnO domains perpendicular to each other with in-plane orientation relationships of [0001]ZnO∥[11¯0]LAO and [11¯00]ZnO∥[11¯0]LAO.