<title>F<formula><inf><roman>2</roman></inf></formula> lasers: high-resolution optical processing system for shaping photonic components</title>

Abstract

A high-resolution 157-nm optical system has been developed for the first time to microprocess optical materials with record short-wavelength F<SUB>2</SUB>-laser radiation. The F<SUB>2</SUB>-laser photons drive strong material interactions in silica glasses for microsculpting surfaces and for imprinting internal refractive index structures. The high-resolution optics deliver a homogenized beam of high on-target fluence (approximately 2.5 J/cm<SUP>2</SUP>) for ablation of fused silica and other wide bandgap optical materials. The system resolution is approaching 1-micron lateral and less than 100-nm depth - sub-wavelength features appropriate for defining optical communication components at 1.55-micrometers wavelength. This paper describes this novel processing system and offers prospects for F<SUB>2</SUB>-laser microfabrication and trimming of photonic components in the telecommunication and general optics manufacturing fields.