GaN 0.011 P 0.989 red light-emitting diodes directly grown on GaP substrates

Abstract

Red light-emitting diodes (LEDs) emitting at 670 nm and employing GaN0.011P0.989 p–n homojunction grown on a (100) GaP substrate by gas-source molecular beam epitaxy with a rf plasma nitrogen source have been obtained. The integrated photoluminescence intensity of GaNP p–n homojunction LED is 5 times stronger than that of Ga0.51In0.49P bulk layer, but the peak width is much broader. Compared to conventional high-brightness AlGaInP red LEDs, our LED structure saves two process steps of etch removing of the GaAs absorbing substrate and wafer bonding to a GaP transparent substrate.