Behavior of Cu0.6Al0.4 films at the SiO2 interface - Concepedia

Concepedia

Publication | Closed Access

Behavior of Cu0.6Al0.4 films at the SiO2 interface

14

Citations

32

References

2000

Year

K Shepherd, Chunping Niu, D. Martini, Jeffry A. Kelber

Applied Surface Science

Materials ScienceSio2 InterfaceEngineeringSurface ScienceApplied PhysicsThin Film Process TechnologyThin FilmsSilicon On InsulatorThin Film Processing

References

	Year	Citations

Page 1