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Band-gap engineering in sputter-deposited ScxGa1−xN
100
Citations
9
References
2001
Year
Materials ScienceBand-gap EngineeringOptical MaterialsEngineeringCrystalline DefectsSurface ScienceApplied PhysicsSemiconductor MaterialThin Film Process TechnologyReactive SputteringThin FilmsScandium ConcentrationThin Film ProcessingBand Gap
Reactive sputtering was used to grow thin films of ScxGa1−xN with scandium concentration of 20%–70% on quartz substrates at temperatures of 300–675 K. X-ray diffraction (XRD) of the films showed either weak or no structure, suggesting the films are amorphous or microcrystalline. Optical absorption spectra were taken of each sample and the optical band gap was determined. The band gap varied linearly with composition between 2.0 and 3.5 eV. ScN and GaN have different crystal structures (rocksalt and wurzite, respectively), and thus may form a heterogeneous mixture as opposed to an alloy. Since the XRD data were inconclusive, bilayers of ScN/GaN were grown and optical absorption spectra taken. A fundamental difference in the spectra between the bilayer films and alloy films was seen, suggesting the films are alloys not heterogeneous mixtures.
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