Publication | Closed Access
Preparation and characterization of Ga2xIn2(1−x)O3 films deposited on ZrO2 (100) substrates by MOCVD
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Citations
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References
2010
Year
Oxide HeterostructuresMaterials ScienceChemical EngineeringMaterials EngineeringEngineeringOxide ElectronicsO3 FilmsSurface ScienceGallium OxideThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film Processing
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