Publication | Closed Access
Properties of SiOxNy films deposited by LPCVD from SiH4/N2O/NH3 gaseous mixture
28
Citations
13
References
1999
Year
Materials EngineeringMaterials ScienceChemical EngineeringSih4/n2o/nh3 Gaseous MixtureEngineeringSurface ScienceSiliceneThin Film Process TechnologyChemistryThin FilmsChemical DepositionSioxny FilmsChemical Vapor DepositionThin Film Processing
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