Concepedia

Publication | Open Access

Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning

DOIFull Paper Access

45

Citations

13

References

2016

Year

Xiaoqing Shi, Philip D. Prewett, Ejaz Huq, Darren M. Bagnall, Alex P. G. Robinson, Stuart A. Boden
Microelectronic Engineering

References

YearCitations

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