Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning

Photoinduced Polymerization of Solid C ₆₀ Films

Apparao M. Rao, Ping Zhou, Kai‐An Wang et al. · Science · 1993 · 1.1K citations

Natural Sciences, Chemistry, Materials Science +17

Subsurface damage from helium ions as a function of dose, beam energy, and dose rate

Richard H. Livengood, Shida Tan, Yuval Greenzweig et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 223 citations

Engineering, Materials Science, Physics +14

Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

Joel K. W. Yang, B. Cord, Huigao Duan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 181 citations · Full text

Natural Sciences, Electrical Engineering, Materials Science +13

An Introduction to the Helium Ion Microscope

John Morgan, John Notte, Raymond Hill et al. · Microscopy Today · 2006 · 140 citations · Full text

Natural Sciences, Materials Science, Physics +10

Sub-10-nm nanolithography with a scanning helium beam

Vadim Sidorkin, Emile van Veldhoven, E. van der Drift et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 135 citations · Full text

Engineering, Materials Engineering, Materials Science +11