Substrate Overlayer Analysis

Substrate Overlayer Analysis is a methodological framework in X-Ray Photoelectron Spectroscopy that enables the quantitative assessment of layered materials by distinguishing between the underlying substrate and overlying film contributions to the photoelectron signal.

68

Publications

2.3K

Citations

220

Authors

93

Institutions

Publications per year

2017–2026

3

Authors

220

  1. JW
    J. W. Niemantsverdriet

    Eindhoven University of Technology, Netherlands

    3 publications · 174 citations

    3

    h-index

  2. PL
    P. L. J. Gunter

    Eindhoven University of Technology, Netherlands

    3 publications · 174 citations

    3

    h-index

  3. PP
    P. Pianetta

    Stanford Synchrotron Radiation Lightsource, United States

    2 publications · 22 citations

    2

    h-index

  4. TK
    T. Kendelewicz

    Stanford University, United States

    2 publications · 22 citations

    2

    h-index

  5. MM
    M. Mohai

    Hungarian Academy of Sciences, Hungary

    2 publications · 86 citations

    2

    h-index

1–5 of 220

Venues

  1. Applied Surface Science

    11 publications · 391 citations

    11

    h-index

  2. Surface Science

    8 publications · 252 citations

    8

    h-index

  3. Surface and Interface Analysis

    SIA · 8 publications · 356 citations

    8

    h-index

  4. 4

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 3 publications · 65 citations

    3

    h-index

1–5