Pattern Masking

Pattern Masking is a visual masking paradigm in which the target stimulus is obscured by a spatially or temporally proximate patterned mask that interferes with its perceptual processing by disrupting form or feature integration.

130

Publications

11K

Citations

272

Authors

132

Institutions

Publications per year

2017–2026

5

Authors

272

  1. BG
    Bruno G. Breitmeyer

    University of Houston, United States

    6 publications · 1.7K citations

    6

    h-index

  2. JM
    John Miles Foley

    University of California, Santa Barbara, United States

    5 publications · 814 citations

    5

    h-index

  3. MH
    Michael H. Herzog

    École Polytechnique Fédérale de Lausanne, Switzerland

    5 publications · 340 citations

    5

    h-index

  4. WN
    William N. Dember

    University of Cincinnati, United States

    4 publications · 112 citations

    4

    h-index

  5. CC
    Chien‐Chung Chen

    Taipei Medical University, Taiwan

    3 publications · 129 citations

    3

    h-index

1–5 of 272

Venues

  1. Vision Research

    14 publications · 609 citations

    13

    h-index

  2. 11

    h-index

  3. Journal of Vision

    10 publications · 582 citations

    10

    h-index

  4. Perception

    8 publications · 160 citations

    8

    h-index

  5. Perception & Psychophysics

    8 publications · 399 citations

    8

    h-index

1–5