Pattern Development Process is a systematic method within surface pattern design that delineates the sequence of conceptual, visual, and technical stages through which a design motif is iteratively conceived, refined, and finalized for application on a surface.
213
Publications
9.4K
Citations
586
Authors
304
Institutions
Publications per year
2017–2026
35
Parents
Publications
213
Authors
586
- LR
3
h-index
- RT
2
h-index
- JA
2
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- DR
2
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- AA
2
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1–5 of 586
Institutions
304
Universidade Federal de Pernambuco
Recife, Brazil
3 h-index
6 publications
150 citations
University of Oslo
Oslo, Norway
3 h-index
10 publications
544 citations
Stockholm University
Stockholm, Sweden
3 h-index
5 publications
629 citations
Technical University of Munich
Munich, Germany
3 h-index
13 publications
516 citations
University of Cambridge
Cambridge, United Kingdom
3 h-index
5 publications
278 citations
Paderborn University
Paderborn, Germany
3 h-index
9 publications
344 citations
University of Stuttgart
Stuttgart, Germany
2 h-index
7 publications
152 citations
Northwestern University
Evanston, United States
2 h-index
5 publications
149 citations
1–8 of 304
Venues
- Development
5 publications · 184 citations
5
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- International Journal of Clothing Science and Technology
5 publications · 175 citations
5
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- Japanese Journal of Applied Physics
JJAP · 4 publications · 65 citations
4
h-index
- Physical Review E
PRE · 4 publications · 180 citations
4
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- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
3 publications · 41 citations
3
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1–5