Oxidizing Annealing

Oxidizing Annealing is a thin film annealing technique in which the material is subjected to controlled thermal treatment in an oxygen-containing atmosphere to promote the formation or enhancement of oxide phases, thereby modifying its structural, electrical, or optical properties.

27

Publications

663

Citations

136

Authors

46

Institutions

Publications per year

2017–2026

5

Authors

136

  1. KT
    K. Tagawa

    University of Tsukuba, Japan

    1 publications · 11 citations

    1

    h-index

  2. AA
    Aïcha Arfaoui

    Tunis El Manar University, Tunisia

    1 publications · 28 citations

    1

    h-index

  3. LI
    L. I. Veligura

    V.E. Lashkaryov Institute of Semiconductor Physics, Ukraine

    1 publications · 18 citations

    1

    h-index

  4. MY
    M. Yousf Usman

    University of Education, Pakistan

    1 publications · 14 citations

    1

    h-index

  5. AP
    A. Paoletti

    University of Rome Tor Vergata, Italy

    1 publications · 23 citations

    1

    h-index

1–5 of 136

Venues

  1. Applied Surface Science

    3 publications · 159 citations

    3

    h-index

  2. Applied Physics Letters

    2 publications · 53 citations

    2

    h-index

  3. Journal of Magnetism and Magnetic Materials

    2 publications · 33 citations

    2

    h-index

  4. IEEE Transactions on Magnetics

    1 publications · 11 citations

    1

    h-index

  5. Journal of Materials Science

    1 publications · 26 citations

    1

    h-index

1–5