Irritation-minimizing Patch Design
Irritation-Minimizing Patch Design is a transdermal patch design approach that belongs to the class of dermatological compatibility optimization strategies, distinguished by its specific integration of hypoallergenic materials, controlled adhesive properties, and skin-stimulus reduction mechanisms to mitigate cutaneous irritation during prolonged wear.
5
Publications
318
Citations
12
Authors
5
Institutions
Publications per year
2017–2026
0
Parents
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Shenyang Pharmaceutical University
Shenyang, China
1 h-index
4 publications
108 citations
Panjab University
Chandigarh, India
1 h-index
2 publications
434 citations
Kyushu Institute of Technology
Kitakyushu, Japan
1 h-index
2 publications
72 citations

Uppsala University
Uppsala, Sweden
1 h-index
3 publications
45 citations

University of Surrey
Guildford, United Kingdom
1 h-index
1 publications
23 citations
1–5 of 5
1 publications · 217 citations
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1 publications · 15 citations
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1 publications · 36 citations
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1 publications · 27 citations
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1 publications · 23 citations
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