Irritation-minimizing Patch Design

Irritation-Minimizing Patch Design is a transdermal patch design approach that belongs to the class of dermatological compatibility optimization strategies, distinguished by its specific integration of hypoallergenic materials, controlled adhesive properties, and skin-stimulus reduction mechanisms to mitigate cutaneous irritation during prolonged wear.

5

Publications

318

Citations

12

Authors

5

Institutions

Publications per year

2017–2026

0

Authors

12

  1. KT
    Kakuji Tojo

    Kyushu Institute of Technology, Japan

    1 publications · 36 citations

    1

    h-index

  2. TS
    Tian Song

    Shenyang Pharmaceutical University, China

    1 publications · 27 citations

    1

    h-index

  3. PA
    Priyanka Arora

    Gilead Sciences (United States), United States

    1 publications · 217 citations

    1

    h-index

  4. JL
    J.N. Lawrence

    University of Surrey, United Kingdom

    1 publications · 23 citations

    1

    h-index

  5. WS
    Wenting Song

    Shenyang Pharmaceutical University, China

    1 publications · 27 citations

    1

    h-index

1–5 of 12

Venues

  1. Journal of Pharmaceutical Sciences

    1 publications · 217 citations

    1

    h-index

  2. International Journal of Pharmaceutics

    1 publications · 15 citations

    1

    h-index

  3. Pharmaceutical Research

    1 publications · 36 citations

    1

    h-index

  4. AAPS PharmSciTech

    1 publications · 27 citations

    1

    h-index

  5. Toxicology in Vitro

    1 publications · 23 citations

    1

    h-index

1–5