Halogen Passivation
Halogen Passivation is a chemical surface treatment method that passivates semiconductor surfaces by forming covalent bonds between surface atoms and halogen atoms, thereby reducing interface defect states through electronic and chemical stabilization.
28
Publications
982
Citations
118
Authors
43
Institutions
Publications per year
2017–2026
9
Parents
28
Electronic passivation of silicon surfaces by halogens
Hichem M’Saad, Jurgen Michel, J. J. Lappe et al. · Journal of Electronic Materials · 1994 · 76 citations
1–5 of 28
118
2
h-index
Centre National de la Recherche Scientifique, France
2 publications · 62 citations
2
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2
h-index
Nanjing University of Information Science and Technology, China
2 publications · 54 citations
2
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2
h-index
1–5 of 118
43

ESPCI Paris
Paris, France
2 h-index
9 publications
270 citations

Nanjing University of Information Science and Technology
Nanjing, China
2 h-index
5 publications
147 citations
Wuhan National Laboratory for Optoelectronics
Wuhan, China
1 h-index
9 publications
207 citations

University College Cork
Cork, Ireland
1 h-index
5 publications
215 citations
University of Pittsburgh
Pittsburgh, United States
1 h-index
4 publications
60 citations
Nanchang Hangkong University
Nanchang, China
1 h-index
11 publications
1K citations

Central South University
Changsha, China
1 h-index
2 publications
52 citations
University of Cambridge
Cambridge, United Kingdom
1 h-index
2 publications
42 citations
1–8 of 43
3 publications · 53 citations
3
h-index
2 publications · 55 citations
2
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2 publications · 63 citations
2
h-index
1 publications · 33 citations
1
h-index
1 publications · 123 citations
1
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1–5