Halogen Passivation

Halogen Passivation is a chemical surface treatment method that passivates semiconductor surfaces by forming covalent bonds between surface atoms and halogen atoms, thereby reducing interface defect states through electronic and chemical stabilization.

28

Publications

982

Citations

118

Authors

43

Institutions

Publications per year

2017–2026

9

Authors

118

  1. JS
    John S. Foord

    University of Oxford, United Kingdom

    2 publications · 69 citations

    2

    h-index

  2. CC
    Catherine Combellas

    Centre National de la Recherche Scientifique, France

    2 publications · 62 citations

    2

    h-index

  3. FK
    Frédéric Kanoufi

    Centre National de la Recherche Scientifique, France

    2 publications · 62 citations

    2

    h-index

  4. LZ
    Lei Zhang

    Nanjing University of Information Science and Technology, China

    2 publications · 54 citations

    2

    h-index

  5. AT
    André Thiébault

    Centre National de la Recherche Scientifique, France

    2 publications · 62 citations

    2

    h-index

1–5 of 118

Venues

  1. Surface Science

    3 publications · 53 citations

    3

    h-index

  2. The Journal of Physical Chemistry C

    2 publications · 55 citations

    2

    h-index

  3. Applied Surface Science

    2 publications · 63 citations

    2

    h-index

  4. Thin Solid Films

    1 publications · 33 citations

    1

    h-index

  5. Advanced Functional Materials

    1 publications · 123 citations

    1

    h-index

1–5