Float-zone Growth

Float-Zone Growth is a semiconductor crystal growth technique in which a polycrystalline rod is locally melted and resolidified in a floating molten zone without the use of a crucible, thereby minimizing contamination and enabling high-purity single-crystal production.

89

Publications

3.7K

Citations

303

Authors

109

Institutions

Publications per year

2017–2026

4

Variants

Float-zone MethodFloat-zone Technique

Authors

303

  1. MH
    Mikio Higuchi

    Hokkaido University, Japan

    6 publications · 167 citations

    6

    h-index

  2. KK
    Kohei Kodaira

    Hokkaido University, Japan

    5 publications · 140 citations

    5

    h-index

  3. JS
    John S. Walker

    University of Illinois Urbana-Champaign, United States

    4 publications · 80 citations

    4

    h-index

  4. HM
    Hiroshi Machida

    Tohoku University, Japan

    3 publications · 81 citations

    3

    h-index

  5. DJ
    Dennis J. O'Connor

    HRL Laboratories (United States), United States

    3 publications · 131 citations

    3

    h-index

1–5 of 303

Venues

  1. Journal of Crystal Growth

    38 publications · 1.2K citations

    21

    h-index

  2. Journal of Applied Physics

    10 publications · 334 citations

    10

    h-index

  3. Applied Physics Letters

    5 publications · 186 citations

    5

    h-index

  4. 3

    h-index

  5. Physics of Fluids A Fluid Dynamics

    2 publications · 95 citations

    2

    h-index

1–5