Binary Mask Design

Binary Mask Design is a methodological framework in image processing and computer vision that employs a binary-valued spatial mask to selectively activate or suppress specific regions of an input signal, thereby enabling precise, discrete control over feature representation or data manipulation.

122

Publications

4.5K

Citations

445

Authors

168

Institutions

Publications per year

2017–2026

31

Authors

445

  1. RS
    Robert Socha

    ASML (Netherlands), Netherlands

    4 publications · 124 citations

    4

    h-index

  2. SS
    Selene Solorza

    Centro de Investigación Científica y de Educación Superior de Ensenada, Mexico

    3 publications · 46 citations

    3

    h-index

  3. JÁ
    Josué Álvarez-Borrego

    Centro de Investigación Científica y de Educación Superior de Ensenada, Mexico

    3 publications · 46 citations

    3

    h-index

  4. DW
    DeLiang Wang

    The Ohio State University, United States

    3 publications · 240 citations

    3

    h-index

  5. PC
    Philipos C. Loizou

    The University of Texas at Dallas, United States

    3 publications · 59 citations

    3

    h-index

1–5 of 445

Venues

  1. 11

    h-index

  2. Optics Letters

    7 publications · 235 citations

    7

    h-index

  3. Optics Express

    7 publications · 253 citations

    6

    h-index

  4. The Journal of the Acoustical Society of America

    JASA · 4 publications · 251 citations

    4

    h-index

  5. Applied Optics

    4 publications · 138 citations

    4

    h-index

1–5