Atomic Diffusion Across Interfaces

Atomic Diffusion Across Interfaces is a fundamental metallurgical process in which atoms migrate across the boundary between two adjacent materials through thermally activated mechanisms, driven by concentration gradients and interfacial energy reduction, to enable bond formation during solid-state joining.

339

Publications

14.5K

Citations

1.3K

Authors

433

Institutions

Publications per year

2017–2026

98

Authors

1.3K

  1. LJ
    L. J. Brillson

    The Ohio State University, United States

    6 publications · 220 citations

    6

    h-index

  2. GM
    G. Margaritondo

    École Polytechnique Fédérale de Lausanne, Switzerland

    5 publications · 250 citations

    5

    h-index

  3. LJ
    L. J. Brillson

    Xerox (United States), United States

    5 publications · 177 citations

    5

    h-index

  4. RZ
    R. Z. Bachrach

    Palo Alto Research Center, United States

    4 publications · 116 citations

    4

    h-index

  5. MK
    Masanori Kajihara

    Tokyo Institute of Technology, Japan

    4 publications · 106 citations

    4

    h-index

1–5 of 1.3K

Venues

  1. Journal of Applied Physics

    21 publications · 1.3K citations

    16

    h-index

  2. Applied Physics Letters

    19 publications · 871 citations

    16

    h-index

  3. Physical Review Letters

    PRL · 13 publications · 1.7K citations

    13

    h-index

  4. Journal of Alloys and Compounds

    10 publications · 325 citations

    10

    h-index

  5. Physical review. B, Condensed matter

    PRB · 10 publications · 431 citations

    10

    h-index

1–5