John N. Kidder - Concepedia

Author

John N. Kidder

University of Maryland, College Park

Also Known As

J. N. Kidder, J. N. Kidder,, J.N. Kidder, J.N. Kidder Jr., John N. Kidder

Publications

376

Citations

H-Index

Concepts

All Affiliations

University of Maryland, College Park University of Washington

About

John N. Kidder is an author at University of Maryland, College Park specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	158
2	Natural Sciences	2	2	38
3	Arts	1	1	105
4	Language Studies	1	1	105
5	Social Sciences	1	1	105

John N. Kidder

Publications

273

Citations

H-Index

Page 1

	Year	Citations
<i>Light and Color in Nature and Art</i> Samuel J. Williamson, H. Z. Cummins, John N. Kidder American Journal of Physics Art TheoryArt HistoryContemporary ArtCultural HeritageLanguage Studies	1984	105
Deposition of AlN at lower temperatures by atmospheric metalorganic chemical vapor deposition using dimethylethylamine alane and ammonia John N. Kidder, Jason S. Kuo, Audunn Ludviksson, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceAluminium NitrideChemical EngineeringAluminum NitrideEngineering	1995	32
Hybrid gas-to-particle conversion and chemical vapor deposition for the production of porous alumina films Quynh T. Thanh Nguyen, John N. Kidder, Sheryl H. Ehrman Thin Solid Films Materials ScienceAluminium NitrideChemical EngineeringHybrid Gas-to-particle ConversionEngineering	2002	24
Comparison of light emission from stain-etch and anodic-etch silicon films John N. Kidder, Philip S. Williams, T. P. Pearsall, Applied Physics Letters Chemical EtchingChemical EngineeringOptical MaterialsEngineeringPhotoluminescence	1992	21
Raman scattering and the π-orbitals in amorphous carbon films K. Sinha, J. Menéndez, Otto F. Sankey, Applied Physics Letters Graphene Quantum DotEngineeringCarbon-based MaterialPhysicsRaman Scattering	1992	20
Process diagnostics and thickness metrology using <i>in situ</i> mass spectrometry for the chemical vapor deposition of W from H2/WF6 Theodosia Gougousi, Yiheng Xu, John N. Kidder, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringThickness MetrologyGas SensorProcess DiagnosticsChemistry	2000	18
Chemical Composition of AlN Thin Films Deposited at 523−723 K Using Dimethylethylamine Alane and Ammonia John N. Kidder, H.K. Yun, J. W. Rogers, Chemistry of Materials Materials ScienceAluminium NitrideChemical EngineeringEngineeringChemical Composition	1998	17
Bright visible photoluminescence in thin silicon films T. P. Pearsall, Jeff C. Adams, John N. Kidder, Thin Solid Films PhotoluminescenceEngineeringApplied PhysicsBright Visible PhotoluminescenceThin Films	1992	15
Influence of gas composition on wafer temperature in a tungsten chemical vapor deposition reactor: Experimental measurements, model development, and parameter identification Hsiao-Yung Chang, Raymond A. Adomaitis, John N. Kidder, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceElectrical EngineeringParameter IdentificationEngineeringWafer Temperature	2001	11
Real-time acoustic sensing and control of metalorganic chemical vapor deposition precursor concentrations delivered from solid phase sources Laurent Henn‐Lecordier, John N. Kidder, Gary W. Rubloff Journal of Vacuum Science & Technology A Vacuum Surfaces and Films	2004	10

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