Hayashi

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Active since

1997

Affiliations

Research Institute for Electromagnetic Materials(Current)

Hayashi is an author at Research Institute for Electromagnetic Materials specializing in engineering, microelectronics, and high-temperature materials.

Publications per year

1997–1997

Publications

Boron Implanted Shallow Junction Formation By High-temperature/ Short-time/high-ramping-rate(400/spl deg/C/sec) RTA

Shishiguchi, Mineji, Hayashi et al. · Symposium on VLSI Technology · 1997 · 40 citations

Engineering, Materials Engineering, Materials Science +13

Development of low-cost high-resolution APD measuring equipment

Uchino, Hayashi, Shinozuka et al. · 1997 · 18 citations

Engineering, Computer Engineering, Electrical Engineering +11

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