Concepedia

Hiromasa Fujimoto

HF

3

Publications

54

Citations

3

H-Index

1992

Active since

Affiliations

Tokyo Institute of Technology(Current)

Hiromasa Fujimoto is an author at Tokyo Institute of Technology specializing in engineering, applied physics, and electrical engineering.

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Publications per year

1992–1993

3

Publications

3

Epitaxial Growth of Metal(CoSi<sub>2</sub>)/Insulator(CaF<sub>2</sub>) Nanometer-Thick Layered Structure on Si(111)

M. Watanabe, Shigeki Muratake, Hiromasa Fujimoto et al. · Japanese Journal of Applied Physics · 1992 · 32 citations

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Epitaxial growth and electrical conductance of metal(CoSi2)/insulator(CaF2) nanometer-thick layered structures on Si (111)

M. Watanabe, Shigeki Muratake, Takashi Suemasu et al. · Journal of Electronic Materials · 1992 · 11 citations

, , +11

A 3SV, h.3W GaAs Power Multi Chip IC for Cellular Phone

Masahiro Maeda, Masaaki Nishijima, H. Takehara et al. · 1993 · 11 citations

, , +10

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