Kwang Duk Na

Reduction of Electrical Defects in Atomic Layer Deposited HfO₂ Films by Al Doping

Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang et al. · Chemistry of Materials · 2010 · 79 citations

Engineering, Control Hfo2 Film, Semiconductor Device +17

Local structure and conduction mechanism in amorphous In–Ga–Zn–O films

Deok‐Yong Cho, Jaewon Song, Kwang Duk Na et al. · Applied Physics Letters · 2009 · 68 citations

Engineering, Solid-state Chemistry, Thin Film Process Technology +17

Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability

Yo‐Sep Min, Seong Keun Kim, Tae Joo Park et al. · Journal of Materials Chemistry · 2008 · 48 citations

Materials Science, High Density, Applied Chemistry +15

Spectroscopic evidence for limited carrier hopping interaction in amorphous ZnO thin film

Deok‐Yong Cho, Jeong Hwan Kim, Kwang Duk Na et al. · Applied Physics Letters · 2009 · 43 citations

Materials Science, Ii-vi Semiconductor, W-zno Suggests +12

Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar∕H2 plasma

Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang et al. · Applied Physics Letters · 2007 · 22 citations

Engineering, Thin Film Process Technology, Chemical Deposition +18