Hydrogen in amorphous and microcrystalline silicon films prepared by hydrogen dilution

U. Kroll, J. Meier, Aqeel Ahmed Shah, +2

Journal of Applied Physics

EngineeringChemistrySilicon On InsulatorDilution LevelHydrogen Dilution +14

Influences of a high excitation frequency (70 MHz) in the glow discharge technique on the process plasma and the properties of hydrogenated amorphous silicon

F. Finger, U. Kroll, V. Viret, +6

Journal of Applied Physics

EngineeringGlow DischargeChemistryElectronic PropertiesPlasma Processing +20

The effective atomic number and the calculation of the composition of phantom materials

J. Weber, D. J. van den Berge

British Journal of Radiology

EngineeringAbsorption SpectroscopyPhantom MaterialsChemistryEffective Atomic Number +20

Influence of hydrogen on the structure of amorphous carbon

X.-M. Tang, J. Weber, Y. Baer, +3

Physical review. B, Condensed matter

EngineeringStress TransitionChemistrySpectroscopic PropertyCarbon-based Material +17

Dispersive diffusion of hydrogen in<i>a</i>-Si:H: Influence of the film deposition temperature

X.-M. Tang, J. Weber, Y. Baer, +1

Physical review. B, Condensed matter

EngineeringSilicon On InsulatorTransport PhenomenaMaterials SciencePhysics +16

Structure stability of hydrogenated amorphous carbon film during thermal annealing

X.-M. Tang, J. Weber, S.N. Mikhailov, +3

Journal of Non-Crystalline Solids

Materials ScienceMaterials EngineeringEngineeringCarbon-based MaterialApplied Physics +3

Depth profiling of W, O and H in tungsten trioxide thin films using RBS and ERDA techniques

O. Bohnké, G. Frand, M. Fromm, +2

Applied Surface Science

Materials ScienceSurface CharacterizationMaterial AnalysisEngineeringOxide Electronics +7

Annealing-temperature influence on the dispersive diffusion of hydrogen in undoped<i>a</i>-Si:H

X.-M. Tang, J. Weber, Y. Baer, +1

Physical review. B, Condensed matter

Materials ScienceEpitaxial GrowthEngineeringDiffusion ResistancePhysics +13

Hydrogen diffusion in aSi:H

X.-M. Tang, J. Weber, Y. Baer, +1

Solid State Communications

RBS-ERDA, XPS and XRD characterizations of PECVD tungsten nitride films

C. Meunier, C. Monteil, C. Savall, +4

Applied Surface Science

Materials ScienceMaterials EngineeringX-ray SpectroscopyEngineeringSurface Science +5