Ki Young Oh

Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique

J. B. Kim, Daewoong Kwon, Kaushik Chakrabarti et al. · Journal of Applied Physics · 2002 · 166 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effect of Structural Properties on Electrical Properties of Lanthanum Oxide Thin Film as a Gate Dielectric

Jin Jun, Doo Jin Choi, Keung Ho Kim et al. · Japanese Journal of Applied Physics · 2003 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +17

Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O₃ thin films at low temperatures for high-density ferroelectric memory applications

Hye Ryoung Kim, Seehwa Jeong, Chung Bae Jeon et al. · Journal of materials research/Pratt's guide to venture capital sources · 2001 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +17

Cation Composition Control of MOCVD (Ba,Sr)TiO[sub 3] Thin Films along the Capacitor Hole

Cheol Seong Hwang, Sang Yong No, Jaehoo Park et al. · Journal of The Electrochemical Society · 2002 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +17

Metallorganic CVD of High-Quality PZT Thin Films at Low Temperature with New Zr and Ti Precursors Having MMP Ligands

Jinshi Zhao, Dong-Yeon Park, Moo Jin Seo et al. · Journal of The Electrochemical Society · 2004 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +17