Concepedia

Hisayoshi Ohshima

HO

Statistics

Publications

6

Citations

99

H-Index

6

Active since

1992

Affiliations

Aichi Institute of Technology(Current)

National Institute of Technology, Suzuka College

Hisayoshi Ohshima is an author at Aichi Institute of Technology specializing in materials science, electronic materials, and engineering.

Publications per year

1992–1998

6

Publications

6

Characterization of HF-Treated Si Surfaces by Photoluminescence Spectroscopy

Tomohiro Konishi, Takafumi Yao, Michio Tajima et al. · Japanese Journal of Applied Physics · 1992 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +15

Study of shallow donor formation in hydrogen-implanted n-type silicon

Yutaka Tokuda, Akira Itô, Hisayoshi Ohshima · Semiconductor Science and Technology · 1998 · 22 citations

Engineering, Materials Engineering, Materials Science +17

Buried metal layer enhanced infrared reflection absorption spectroscopy for photoreactions induced by synchrotron radiation on SiO2 surfaces

Y. Zhang, Shusuke Sato, Hisayoshi Ohshima et al. · Applied Surface Science · 1994 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +13

Valence-band density of states of near-noble-metal (Ni,Pd,Pt) monosilicides by using soft-x-ray-emission spectroscopy

S. Yamauchi, Satomi Kawamoto, Masaaki Hirai et al. · Physical review. B, Condensed matter · 1994 · 13 citations

Natural Sciences, Chemistry, Materials Science +16

Observation of hydrogen in commercial Czochralski-grown silicon wafers

Yutaka Tokuda, Isao Katoh, Hisayoshi Ohshima et al. · Semiconductor Science and Technology · 1994 · 12 citations

Engineering, Electrical Engineering, Materials Science +17

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